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The Power of Lithography in Microfluidic Manufacturing

Photo and nanoimprint lithography are groundbreaking microfabrication techniques that are shaping the future of microfluidics. These techniques meticulously transfer patterns onto a substrate and define microscale features with exceptional detail.

Photo Lithography

This traditional approach uses UV light to transfer a pattern from a mask to a light-sensitive layer applied on the substrate. It's versatile, enabling two primary processes: UV contact and stepper lithography, catering to features ranging from sub-micrometer to larger scales.

Nano Imprint Lithography (NIL)

A physical method that impresses a pattern onto a substrate using a mold. It excels at creating extremely fine features down to sub-100 nm, suitable for applications requiring intricate patterns and high density.

NIL- / Photo Lithography

Unlock the full potential of lithography method for your microfluidic projects with our customised workshops. Tailored to your individual needs, these sessions dive deep into specifying product requirements and establishing the optimal process for your project. By focusing on precision and efficiency from the outset, we ensure that your project is compliant with industry standards and optimised for success.

Custom Workshops for Precision Lithography

Microfluidic structures on disc made by nano imprint lithograpfy.

Compatible with a variety of substrates, enabling flexibility in device design and application.

Versatility across Materials

Streamlines the manufacturing process, allowing for quicker prototyping and production cycles.

Efficiency and Speed

Especially beneficial in mass production, reducing the per-unit cost of microfluidic devices.

Cost-Effective for High Volume